Zero Liquid Discharge (ZLD) has become a key option for China's future industrial green and low-carbon transformation.
ZLD aims to maximize the recycling of industrial wastewater through comprehensive water treatment technologies, minimizing or even eliminating final liquid waste.
Among the many technological pathways for achieving ZLD, advanced oxidation (UV-AOP) technology plays a crucial role.
UV-AOP technology, due to its ability to generate highly oxidizing hydroxyl radicals (.OH), is particularly suitable for treating difficult-to-degrade, highly toxic organic wastewaters in the chemical industry, such as those from fine chemicals, pesticides, dyes, and pharmaceutical intermediates.
UV-AOP is often used as a deep treatment or pretreatment unit to improve the biodegradability of wastewater, reducing the burden and toxicity impact of subsequent biological treatment.
The electronics manufacturing industry places extremely high demands on process water purity, and ultrapure water (UPW) is an indispensable key material in its production.
UPW has extremely strict control standards (such as SEMI standards) for ions, organic matter (TOC), microorganisms, particulate matter, and dissolved gases.
The wastewater generated during the electronics manufacturing process is complex in composition, some of which is highly toxic. Achieving zero discharge of electronic wastewater places even higher demands on UV advanced oxidation technology.
Ozone Generator Applications
Ultraviolet Advanced Oxidation (UV-AOP) Applications
UV Disinfection Applications
ZLD Applications:
UV disinfection is often used as a final safeguard before water reuse or in specific treatment steps (such as as an auxiliary means of TOC removal or to prevent biofilm growth).
Ozone is primarily used for deep oxidation (degradation of COD and TOC), decolorization, deodorization, and biodegradability in wastewater. It is also used as a component in certain advanced oxidation processes (such as O₃/H₂O₂).
UV-AOP is a key technology for the decomposition of recalcitrant organic pollutants. It can degrade these stubborn pollutants, thereby improving the treatment efficiency of the entire ZLD system and ensuring effluent quality.
CLEAR中压紫外
ONYX-Clear-SZ管道式中压紫外消毒器,采用中压多谱段紫外灯,不仅实现DNA/RNA的破坏,同时破坏其细胞内的酶及蛋白质,杀菌更为彻底。用于消毒杀菌和降解水中亚硝基二甲胺、1,4-二噁烷、内分泌干扰物(EDCs)、残留农药、蓝藻毒素、GSM(土臭素)和2-MIB(二甲基异茨醇)等有毒微污染物质。
另外,将O3、H2O2等氧化剂与紫外光结合,如UV-O3、UV-H2O2等工艺,可以用于处理污水中CC14、多氨联苯等难降解物质和有机物的氧化去除。
MOL板式臭氧发生器
ONYX-MOL板式臭氧发生器采用模块化设计,根据产气量可积木式(Blocks)拼装,结构紧凑。
采用高纯度铝基陶瓷电极,超强抗氧化微弧氧化工艺,系统性能稳定可靠,超低衰减率。均匀微间隙高频放电,高效节能20~35%,臭氧浓度0~240mg/L可调,节氧高达40%。
电源上电自启动设计,全程无需人为干预。运行过程自我检测诊断,异常处理及智能恢复,运行状态边缘计算与云服务协调。
UV-Fenton光芬顿
光芬顿是一种结合了传统芬顿反应与光化学激发的高级氧化技术(AOPs),通过紫外辐照显著增强芬顿体系的氧化能力,实现对难降解有机污染物的高效矿化。其核心在于利用光能加速铁离子的循环并促进更多羟基自由基(·OH)的生成。其在降低铁泥产量、提升反应速率、降低运行成本方面的优势显著,尤其适合处理高浓度、高毒性工业废水。
UV-AOP高级氧化
紫外高级氧化技术(UV-AOP)是一种利用紫外线辐射引发氧化反应的环境友好型技术。其核心在于利用紫外光激发氧化剂产生强氧化能力的自由基,进而降解有机物和无机污染物,具有高效、环保、无二次污染等特点。根据不同的氧化剂种类,紫外高级氧化技术可分为多种系统,其中最为常见的包括UV/过氧化氢、UV/臭氧、UV/氯等系统。
ONYX-Clear-SZ-AOP 可以作为UV-AOP技术的紫外光源。这款紫外线高级氧化系统可用于分解亚硝基二甲胺、1,4-二噁烷、内分泌干扰物(EDCs)、残留农药、蓝藻毒素、GSM(土臭素)和2-MIB(二甲基异茨醇)等有毒微污染物质。
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